| TRACES ICPMS/GFAA |
IC-ANIONS | IC-CATIONS | ASSAY | PARTICLES ED-XRF |
|
|---|---|---|---|---|---|
| Acetic Acid | |||||
| Amnonium Hydroxide | |||||
| BOE / BHF's | |||||
| Citric Acid | |||||
| Hydrochloric Acid | |||||
| HydroFluoric Acid 49% | |||||
| HydroFluoric Acid diluted | |||||
| Hydrogen Peroxide | |||||
| MAE's | |||||
| NH4F | |||||
| Nitric Acid | |||||
| Phosphoric Acid | |||||
| Potassium Hydroxide | |||||
| SC1 | |||||
| SC2 | |||||
| Sodium Hydroxide | |||||
| Slurries | |||||
| Spin-Etchants | |||||
| Sulfuric Acid | |||||
| TMAH | |||||
| Water |
… and many more chemicals. Do not hesitate to call if your specific chemical is not listed above.
| Acronym | Common Chemical Name |
|---|---|
| BOE | "Buffered Oxide Etch", mixture of NH4F and HF |
| BHF | "Buffered HF", is another acronym for BOE |
| MAE's | "Mixed Acid Etchants". Multiple combination of 2 or 3 Acids including but not limited to:
|
| SC1 | Mixture of NH4OH + H2O2 [+ water] |
| SC2 | Mixture of HCl + H2O2 [+ water] |
| Spin-Etchants | Mixtures of 3 to 4 Acids including but not limited to:
|
| TMAH | Tetramethyl Ammonium Hydroxide [Developer and cleaning agent] |