| TRACES ICPMS/GFAA |
IC-ANIONS | IC-CATIONS | ASSAY | PARTICLES ED-XRF |
Residue | K-F [water] | |
|---|---|---|---|---|---|---|---|
| Acetone | |||||||
| Cyclohexanone | |||||||
| EBR's | |||||||
| EEP | |||||||
| Ethanol | |||||||
| Ethyl Lactate | |||||||
| Ethylenediamine | |||||||
| Ethylene Glycol | |||||||
| GBL | |||||||
| IPA | |||||||
| MEK | |||||||
| Methanol | |||||||
| MIBK | |||||||
| MPK | |||||||
| NBA | |||||||
| NMP | |||||||
| n-Propanol | |||||||
| PGMEA | |||||||
| Strippers | |||||||
| Triethanolamine | |||||||
| Water | |||||||
| Xylene |
… and many more solvents. Do not hesitate to call if your specific solvent is not listed above.
| Acronym | Common Chemical Name |
|---|---|
| EBR's | Edge Bead Removers [related to the Photoresist removal] |
| EEP | Ethyl 3-EthoxyPropionate |
| GBL | Gamma Butyro Lactone |
| MEK | Methyl Ethyl Ketone |
| MIBK | Iso Butyl Methyl Ketone |
| MPK | Methyl Propyl Ketone |
| NMP | N-Methyl Pyrrolidone |
| PGMEA | Propylene glycol monomethyl ether acetate also known as "PM Acetate", Positive Resist Solvent |
| Strippers | Solvent Mixtures used to remove Photoresists |