We offer analytical testing on the entire array of process acids, bases, and all mixed chemistries routinely used in semiconductor manufacturing. We currently test most inorganic reagents and materials that are important in emerging fields of manufacturing and process technologies. Call us to determine how we can apply our expertise to your process chemical.

Analyzed : Typical Semiconductor Acids – Bases – Mixtures

 

TRACES ICPMS/OES IC-ANIONS IC-CATIONS ASSAY
Acetic Acid
Ammonium Hydroxide
BOE / BHF’s
Citric Acid
Hydrochloric Acid
Hydrofluoric Acid 49%
Hydrogen Peroxide
Lithium Hydroxide
Lithium Salts
MAE’s
NH4F
Nitric Acid
Phosphoric Acid
Potassium Carbonate
Potassium Hydroxide
SC1
SC2
Slurries
Sodium Hydroxide
Spin-Etchants
Sulfuric Acid
TMAH
Tetrafluoroborates
Water

Acronym Common Chemical Name
BOE “Buffered Oxide Etch”, mixture of NH4F and HF
BHF “Buffered HF”, is another acronym for BOE
MAE’s “Mixed Acid Etchants”. Multiple combination of 2 or 3 Acids including but not limited to:

  • H2SO4
  • HNO3
  • H3PO4
  • NH4F
  • HF
  • HCl
  • CH3COOH
SC1 Mixture of NH4OH + H2O2 [+ water]
SC2 Mixture of HCl + H2O2 [+ water]
Spin-Etchants Mixtures of 3 to 4 Acids including but not limited to:

  • H2SO4
  • HNO3
  • H3PO4
  • HF
  • HCl
TMAH Tetramethyl Ammonium Hydroxide
[Developer and cleaning agent]