We offer analytical testing on the entire array of process acids, bases, and all mixed chemistries routinely used in semiconductor manufacturing. We currently test most inorganic reagents and materials that are important in emerging fields of manufacturing and process technologies. Call us to determine how we can apply our expertise to your process chemical.
Analyzed : Typical Semiconductor Acids – Bases – Mixtures
| TRACES ICPMS/OES | IC-ANIONS | IC-CATIONS | ASSAY | |
|---|---|---|---|---|
| Acetic Acid | ||||
| Ammonium Hydroxide | ||||
| BOE / BHF’s | ||||
| Citric Acid | ||||
| Hydrochloric Acid | ||||
| Hydrofluoric Acid 49% | ||||
| Hydrogen Peroxide | ||||
| Lithium Hydroxide | ||||
| Lithium Salts | ||||
| MAE’s | ||||
| NH4F | ||||
| Nitric Acid | ||||
| Phosphoric Acid | ||||
| Potassium Carbonate | ||||
| Potassium Hydroxide | ||||
| SC1 | ||||
| SC2 | ||||
| Slurries | ||||
| Sodium Hydroxide | ||||
| Spin-Etchants | ||||
| Sulfuric Acid | ||||
| TMAH | ||||
| Tetrafluoroborates |
| Acronym | Common Chemical Name |
|---|---|
| BOE | “Buffered Oxide Etch”, mixture of NH4F and HF (by Auto titration) |
| BHF | “Buffered HF”, is another acronym for BOE (by Auto titration) |
| MAE’s | “Mixed Acid Etchants”. Multiple combination of 2 or 3 Acids including but not limited to:
|
| SC1 | Mixture of NH4OH + H2O2 [+ water] (by Auto titration) |
| SC2 | Mixture of HCl + H2O2 [+ water] (by Auto titration) |
| Spin-Etchants | Mixtures of 3 to 4 Acids including but not limited to:
|
| TMAH | Tetramethyl Ammonium Hydroxide [Developer and cleaning agent] (by Auto titration) |