In recent years our customers have expanded their use of and dependency on organic solvents and process fluids. Precilab takes great pride in the ability to handle and analyze the emerging generation of high purity organic solvents. Analysis for trace metals in organic solvents has been a difficult problem for many laboratories as the demands for ultra-high purity solvents require hybrid techniques or expensive sample introduction systems. We specialize in this area and can provide quick-turn analytical results for even the most problematic organic chemicals. Some of our customers are now involved in many emerging technologies such as lithium ion-battery manufacturing, nano-materials and bio-printing to name a few.

Analyzed – Typical semiconductor chemicals and solvents.

 
TRACES ICPMS/OES IC-ANIONS IC-CATIONS ASSAY RESIDUE K-F [WATER]
Acetone
Cyclohexanone
Cyclopentanone
Di-Acetone alcohol
EBR’s
EEP
Ethanol
Ethyl Lactate
Ethylene Glycol
Ethylenediamine
GBL
Hexanone
HMDS
IPA
Isoamyl alcohol
Isobutyl isobutyrate
MEK
Methanol
Methyl isobutyl carbinol
Methyl methoxy propionate
MIBK
MPK
NBA
n-Butanol
NMP
n-Propanol
PGMEA
Propylene Glycol
Strippers
TEOS
Tetrahydrofuran
Toluene
Triethanolamine
Water
Xylene

Acronym Common Chemical Name
EBR’s Edge Bead Removers [related to the Photoresist removal]
EEP Ethyl 3-EthoxyPropionate
GBL Gamma Butyro Lactone
MEK Methyl Ethyl Ketone
MIBK Iso Butyl Methyl Ketone
MPK Methyl Propyl Ketone
NMP N-Methyl Pyrrolidone
PGMEA Propylene glycol monomethyl ether acetate also known as “PM Acetate”, Positive Resist Solvent
Strippers Solvent Mixtures used to remove Photoresists